ENCLOSURE
1
[
Magnetic
Tape
Manufacturing
NESHAP,
Subpart
EE
­
Residual
Risk
Evaluation]

1.
Please
review
the
following
annual
toxics
release
inventory
(
TRI)
emissions
data
reported
for
your
facility
in
2000
and
revise/
comment
where
necessary:

Pollutant
Stack
(
Pounds)
Fugitive
(
Pounds)
Comments/
Corrections
methyl
ethyl
ketone:
4,880
375,300
_________________________________________

toluene:
1,200
90,900
_________________________________________

cobalt:
0
1,155
_________________________________________

cobalt
compounds:
250
0
_________________________________________

_______________:
________
_______
_________________________________________

2.
What
was
the
basis
for
the
emissions
calculation/
estimation
for
the
listed
compounds?
(
AP­
42
emission
factors,
engineering
judgement,
internal
study,
test
data/
reports,
etc.)

Methyl
ethyl
ketone:
Mass
Balance
Toluene:
Mass
Balance
Cobalt:
Mass
Balance
cobalt
compounds:
Mass
Balance
other_________________:

3.
Estimate
the
percent
of
total
emissions
coming
from
the
mix
room/
area,
coating
lines(
s),
ovens(
s),
control
equipment,
and
any
other
emission
sources
on
an
annual
basis
using
Table
1
(
on
back
of
this
page).

4.
Provide
facility
plot
or
diagram
showing
each
emission
point
(
source).
For
each
"
general"
emission
point,
include
an
overview
description,
including
physical
dimensions
of
process
areas/
rooms,
equipment,
stacks(
s),
etc.
(
on
a
separate
page
if
necessary).
TABLE
1.
EMISSION
SOURCE
INFORMATION
WITHIN
A
FACILITY
[
Magnetic
Tape
Manufacturing
NESHAP,
Subpart
EE
­
Residual
Risk
Evaluation]

Pollutant
Emission
Source
5
%
Mixing
Room
25
%
Coating
Line(
s)

50
%
Oven(
s)

15
%
Control
Equipment
Example:
Xylene
5
%
Other:
Misc.
Transfer
20%
Mixing
Room
30%
Coating
Line
35%
Oven
5%
Control
Equipment
Methyl
Ethyl
Ketone
10%
Other:
Misc.
Fugitives
20%
Mixing
Room
30%
Coating
Line
35%
Oven
5%
Control
Equipment
Toluene
10%
Other:
Misc.
Fugitives
NA
Mixing
Room
NA
Coating
Line
NA
Oven
25
Control
Equipment
Cobalt
75
Other:
Misc.
Fugitives
80%
Mixing
Room
NA
Coating
Line
NA
Oven
NA
Control
Equipment
Cobalt
Compounds
20%
Other:
Misc.
Fugitives
